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RecordNumber
34897
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Title
Ion implantation technology :16th International Conference on Ion Implantation Technology, IIT 2006, Marseille, France, 11-16 June 2006
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Author Statement
editors, Karen J. Kirkby ... [et al.]
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Publication
American Institute of Physics
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Collation
xvii, 664 p. : ill. ; 28 cm.
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Series
AIP conference proceedings,0094-243X ;v. 866
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Notes
Includes bibliographical references and index
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Contents
Doping processes in semiconductors -- Cluster implantation in doping -- PIII and plasma doping -- Materials : novel techniques and applications -- Implant technology -- Implant technology (materials) -- Process control & yield -- Process control & yield (metrology) -- Materials
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Subject
Semiconductors,Semiconductor doping
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ADDED ENTRIES
AU Kirkby, Karen J , TI , SE , TI AIP conference proceedings ;
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LC Class
QC
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LC Number
702.7.
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LC CutterNumber
I55 I577
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LC Date
2006
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LC NO
QC 702.7. I55 I577 2006
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Published_Year
c2006
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Link To Document :
